- Additional or repeated training may be required if the staff notes user deficiencies.
- Times are approximate, and actual staff training time will be billed per user.
- Training Charge = (number of sessions)x(approx. session duration)x(Staff rate)
|
Equipment |
Training Contact |
Minimum Number of Sessions |
Approx. Session Duration (Hrs) |
| General Training Sessions | |||
| Safety Tour | Paula | 1 | 1.5 |
| Basic Photolithography | Yusha | 1 | 1.5 |
| Photolithography with Metal Liftoff | Yusha | 1 | 7 |
| Wet Bench | Ryan | 1 | 1.5 |
| Lithography | |||
| CEE Model 100 Spinner | Yusha | 1 | 0.5 |
| Brewer (1 and 2) | Yusha | 1 | 0.5 |
| Solitec 5110-CT (1 and 2) | Yusha | 1 | 0.5 |
| Karl Suss MA4 Aligner (1 and 2) | Yusha | 2 | 1 |
| EVG 620 Mask Aligner | Yusha | 2 | 1 |
| GCA 8500 i-line Wafer Stepper | Yusha | 3 | 1 |
| DEPOSITION | |||
| CHA AutoTech II E-Beam Evaporator | Chan | 2 | 3.5 |
| Lesker Labline Sputter (DC only) | Chan | 2 | 3.5 |
| Lesker Labline Sputter (RF and reactive) | Chan | 1 (prior DC training required) | 4 |
| AV Vision 310 PECVD | Chan | 2 | 1 |
| Plasmatherm Versaline HDPCVD | Chan | 2 | 2 |
| ETCHING | |||
| AV Apex SLR RIE/ICP | Yusha | 2 | 1 |
| AV Apex SLR RIE | Yusha | 2 | 1 |
| AV Vision 320 RIE | Yusha | 2 | 1 |
| Plasmatherm Versaline Deep Si Etcher | Yusha | 2 | 1 |
| Plasma Equip. Tech. Services (PETS) RIE | Yusha | 2 | 0.5 |
| SPTS XactiX e1 | Yusha | 2 | 0.5 |
| DPSS Laser | Yusha | 2 | 1 |
| Idonus HF Vapor Phase Etch System | Yusha | 1 | 0.5 |
| ANALYTICAL | |||
| Bruker Dektak XT | Chan | 1 | 1 |
| Nanospec AFT | Chan | 1 | 0.5 |
| Dektak 3ST Surface Profilometer | Chan | 1 | 1 |
| J.A. Woollam M-2000 | Chan | 1 | 1.5 |
| THERMAL | |||
| Allwin AW610 Rapid Thermal Processor | Chan | 1 | 1.5 |
| Annealsys AS-One 100 HT Rapid Thermal Processor | Chan | 1 | 2 |
| Yamato Scientific America DP63 Programmable Oven | Yusha | 1 | 0.5 |
| 500C Oven | Yusha | 1 | 0.5 |
| PACKAGING | |||
| Disco DAD 321 Dicing Saw | Chan | 2 | 3 |
| Tousimis Autosamdri-815 | Yusha | 1 | 2 |
| EVG 501 Bonder | Yusha | 1 | 0.5 |
| EVG 810 Plasma Activation | Yusha | 1 | 0.5 |
| CLEANING AND PREPARATION | |||
| Semitool PSC-101 Spin Rinse Dryer | Yusha | 1 | 0.5 |
| MICROSCOPY | |||
| FEI 430 NanoSEM | Ryan | 2 | 2 |
| Electron Beam lithography | Ryan | 3 | 2 |
| FEI Scios DualBeam SEM/FIB | Andrew | 2 | 2 |
| EDS and EBSD materials characterization | Andrew | 2 | 2 |
| Quorum Tech Q150RES | Ryan | 1 | 0.5 |
| Zeiss Axiotron Optical Microscope (1 and 2) | Yusha | 1 | 0.5 |
| Nikon Optical Microscope | Yusha | 1 | 0.5 |
| ELECTRICAL TEST | |||
| HP 4155a Analyzer and Probe Station | Yusha | 1 | 1 |
| Probex 4pt Probe | Yusha | 1 | 0.5 |
